By Section:
1. Semiconductor Silicon
1.1 General Techniques
1.2 Si by INAA; Literature values
1.3 Our own INAA analyses
1.4 Si feasibility by Measurement Objective
1.5 SOS
2. Germanium
2.1 General Characteristics
2.2 Ge SIMS analysis
3. Noble Metal Foils and Films
4. Concentrator Target Materials
4.1 Single Crystal Noble Metals
4.2 Diamonds
4.2.1Diamond SIMS Study
4.2.2Diamond SIMS Results: Impurities
4.2.3Diamond SIMS Results: Diffusion
4.2.4Diamond SIMS Study Conclusions
4.3 Comparisons Between Noble Metals and CVD Diamond
5. Materials for Noble Gas Collection
5.1 Solar Wind
5.2 Energetic Particles
Appendix: Summary on oxygen in diamond, by K.M. Rutledge
Because of the rarity of most elements in the solar wind the primary
requirement for the collector materials is that they have extremely
low impurity levels. Since it is unlikely that any one material
will have optimum characteristics for all elements and all analysis
techniques, the collectors will combine several different materials.
Generally speaking, analytical techniques,
such as secondary ion mass spectrometry (SIMS) or resonance ion
mass spectrometry (RIMS), that only analyze the surface layers
containing the implanted solar wind have fewer materials purity
difficulties than those that require bulk analysis of the entire
collector thickness. For nominally bulk analytical methods such
as radiochemical neutron activation analysis (RNAA), "surface
stripping" techniques are required which preferentially extract
the surface layer holding the implanted solar wind.
1. Semiconductor Silicon. Silicon is an excellent substrate for RIMS and RNAA, but not as good for SIMS because of molecular ion interferences.
From the aspect of purity, by far the most promising materials
are semiconductors, with the most known about silicon. For many
electronics products, the presence of 5-20 ppm oxygen is desirable
because it getters lithophile impurities, causing them to lose
their conductivity; consequently lithophilic impurities can be
tolerated to some degree. This is the case for the Czochralski
(CZ) method of crystal growth, in which a crystal is pulled from
a SiO2 crucible. For float-zone (FZ) growth the crystal
is grown from a poly-crystalline rod by passing through an RF
coil in a non-oxidizing atmosphere. The FZ method is necessary
to obtain wafers of higher purity, particularly in the CNO content,
but also presumably for any other elements which might be present
in trace quantities in the SiO2 crucible. Recent efforts
to achieve the highest purity crystals have focused on using higher
purity raw materials. This was motivated by a desire to reduce
concentrations of B, which is not excluded during crystallization
and is one of the principal acceptor impurities. The results are
quite favorable for other conductive impurities as well, with
reductions of up to a factor of ten. The resistivity of the semiconductor
is a general measure of its conductive impurities, and by extension,
should be an indicator of overall purity. FZ Si wafers grown from
normal stock typically have impurity levels of ~2000 ohm cm; those
produced from ultra-high purity poly-silicon average ~18,000 ohm
cm, and we have obtained material with over 50,000 ohm cm.
Table M1. Impurities measured or attempted in float-zone silicon
wafers by methods other than INAA.
| B | 18,000 | |||||
| B | 2,000 | |||||
| C | 2,000 | |||||
| N | 2,000 | |||||
| O | 2,000 | |||||
| Al | 18,000 | |||||
| P | 2,000 | |||||
| P | 18,000 | |||||
| As | 18,000 | |||||
| Mg | ----- | |||||
| Ca | ----- |
1Maurits et al.
(1990) abstr. #394, Fall Meeting Electrochem Soc., Pennington,
NJ.
2Dreier (1990) Nucl.
Meth. A288, 272.
3Our own unpublished
SIMS analyses.
4Solar wind measurement
is averaged over the topmost 100 nm for a 2 year normal flux.
Multiply by 10-5 to convert from cm-3/(top
100 nm) to cm-2.
5PL = Photoluminescence;
IR = Infrared Spectroscopy; SIMS = Secondary Ionization Mass Spectrometry
6Where measured values
are not given, the impurity is below the detection limit.
1.1 General Techniques. Table M1 gives impurity measurements made on Si wafers by techniques other than neutron activation analysis (NAA). For comparison, estimated solar wind concentrations are based on an H flux of 3 x 108 cm-2s-1 and a solar wind Si/H ratio of 1 x 10-4. Estimates of all the solar wind abundances are calculated by assuming that the relative abundance pattern is similar to CI chondrites for most nonvolatile elements (Document B), e.g., Anders and Grevesse (1989), and that the solar wind atoms are spread over the top 100 nm for light element targets (C, Si, Ge) and over 50 nm for heavy element targets (Pt, Au). This results in conservative solar wind abundance estimates.
Additional measurements: We are planning to use thermal ionization mass spectrometry (TIMS) to make additional bulk purity measurements. Blank measurements to date at the Caltech TIMS lab indicate that , with < 10 g of material, the following elements can be assayed to blank levels comparable to INAA: Mg, Ca, Ti, Sr, Sm, Nd, and Ba. Inductively coupled plasma mass spectrometry will also be used to check detection limits of the following elements to below the expected solar wind concentration: Na, Mg, Al, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Ru, Y, Ba, and Pt (R. Brown, personal communication).
1.2 Si by INAA: Literature values. Instrumental neutron
activation analysis (INAA) is the primary
technique used by industry to determine individual elemental impurities
in bulk Si. INAA is well-suited for bulk analysis, and gives results
for a large number of elements at once. Its sensitivity for the
electrically active metals of interest to industry is quite good.
Fig. M1 shows literature INAA results from several analyses for
a large number of elements. They are plotted logarithmically, normalized to elemental solar
wind concentrations from a 2-year fluence averaged over the top
100 nm, as above. The dashed line shows our materials purity goal
of (impurity/s.w.) £ 0.01. It
is important to note that only the filled symbols are actual measurements;
open symbols (and X's) are detection limits. An upper limit below
the dashed line is a significant result. An upper limit above
the dashed line tells us nothing. Detection limits vary according
to the neutron fluence, the size of the sample, and the counting
times. For the most comprehensive study, by Takeuchi et al.
(1993), a symbol is given at both upper and lower ends of the
range of measurements, although nearly all of Takeuchi's lower
end values are simply detection limits. In general, relatively
few measurements were made above the detection limits, and most
measurements of bulk impurities are below the solar wind concentration.
Among these 48 elements, except for Au and As, there are no cases
where the INAA results are consistently above the design
goal.
Overall, Figure M1 demonstrates why we have emphasized Si as a
collector material. It should be noted that the study of Takeuchi
et al., which is most useful for our purposes, did not use FZ
silicon which may be higher purity. Given the requirement to measure
the solar wind element fluence to an accuracy of ±5%
(1s), a very conservative purity criterion
is that the background level of a given element be less than 1%
of the solar wind concentration, e.g., as shown by the dotted
horizontal line in Fig. M1. Using this criterion, Table M2 summarizes
the situation, using data from Table M1 and Fig. M1, in terms
of the specific science objectives given in proposal
Table 1-2. Elements for
which there are only upper limits
which are too high are omitted from Table M2.
Table M2
ELEMENTS WITH DOCUMENTED CONCENTRATIONS IN Si
£1%
OF SOLAR WIND IN AT LEAST ONE SAMPLE
General: C, N, O, Na, Al, P, K, Ca, Cr, Fe, Co, Ni, Cu, Zn, Ga,
Zr, Ag, Hf, Hg, Th
ELEMENTS WITH DOCUMENTED CONCENTRATIONS IN Si
>1% OF
SOLAR WIND AND NO ANALYSIS £1%
General: B, As, Cd, In, Nd, Ta, U
In many cases background corrections larger than the nominal 1% would be
acceptable, although this would have to be evaluated on an element by element
basis, allowing for the flight materials and the analytical technique to be used.
1.3 Si by INAA: Our own analyses. We are
attempting to confirm the literature conclusions with our
own analyses of Si from known vendors. During Phase A co-investigator
M. Ebihara carried out several neutron activation analyses on Si
crystals from two candidate vendors. In choosing materials, we
singled out FZ crystals as likely to be more desirable than
CZ crystals due to the absence of contaminants leached from the
CZ crucible. Of the four known foreign FZ Si producers, Topsil
was used because they had the highest resistivity material and
were the most helpful. Within the US, only one producer, Unisil,
has recently (1994) come on line, though another producer may
be in the works.
A 19 g Topsil sample (resistivity > 50 kOhm) was irradiated
in 1994 at the JRR-3 reactor in site HR-2 for approximately 2
days. Estimates of the flux from co-irradiated standards give
7.1 and 7.0 x 1013 n/cm2/sec, respectively
for 1173 keV and 1332 keV. The sample was cooled for 1 month before
measurement at the Japan Atomic Energy Research Institute (JAERI).
Before measurement, 1.2% of the material was etched away to remove
surface contaminants. The counting time was 2 x 105
sec. each at distances of 0 and 5 cm from the Ge detector.
Irradiation of two additional Si crystals, one each from Topsil
and Unisil, took place in 1995. This time the neutron fluence
was three times the 1994 irradiation with other conditions essentially
the same. Because of relatively high brehmstrahlung background
(mentioned below) detection limits were only comparable to
the 1994 data.
The Ebihara data are also plotted as detection limits on
Fig. M1.
Only one element (Au) was actually measured above detection limits.
Comparison with the literature data in Fig. M1 shows that with
some exceptions Ebihara's detection limits for the elements shown
are generally in the same range as those in the literature. Fewer
elements are shown in part because only one count was done, with
no attempt to measure elements with short half lives.
Dr. Ebihara's analyses revealed a fundamental limit to bulk analysis of Si.
The neutron-rich radioactive isotopes 31,32Si have half-lives
of 2.6 hours and 280 years, respectively. With a moderately high neutron flux, a
significant amount of double neutron capture occurs on 30Si
to produce the relatively long-lived 32Si. Consequently, radiochemistry
(RNAA) will be required to produce lower detection limits than those
shown in Fig. M1.
A=80-90 Group: Se, Br
A=120-140 Group: Sb, Cs
REE: La, Ce, Sm, Eu, Tb, Yb
Pt-Group: Ir
A=80-100 Group: (none)
A=120-140 Group: Sn
REE: Lu
Pt-Group: Mo, W, Au
| Fig. M2 | 31P 100% |
32P 14.3d |
33P 25.3d | |
| 28Si 92.2% |
29Si 4.7% |
30Si 3.1% |
31Si 2.62h |
32Si ~280a |
1.4 Si feasibility by Measurement Objective. Based on the above results, proposal Table 2-4 shows that Si will be a suitable collector material for most of the 18 specific measurement objectives. As shown in Table 2-5, some of the specific measurement objectives encompass a number of elements. The following paragraph documents these objectives for Si on an element-by-element basis based on Table M2 and Figure M1.
Objective 8: The A=80-90 group of elements consists of Se,Br,Rb,Sr, and Y. Literature data show adequate purity for Se. In Phase B we shall obtain RNAA measurements of Se. Br is more difficult. Literature INAA data for Rb give an upper limit of about 0.1 times the SW value, but the geochemically similar element, Cs, is present at about 0.001 SW levels. Rb and Sr will be analyzed in Phase B by thermal ionization mass spectrometry (TIMS). Y analysis by ICPMS should have detection limits below the solar wind value (R. Brown, personal communication) and we can also attempt to get a measurement by synchrotron radiation X-ray fluorescence using the high energy photons from the Argonne facility. Y is geochemically similar to the mid-heavy REE elements. Literature Si analyses for Tb and Yb are distinctly below the 0.01 limit. The A=120-140 elements are Sn, Sb, Te, I, Cs and Ba. The literature data indicate that impurity levels of Cs and Sb are sufficiently low. Takeuchi et al report some samples with Sn concentrations at about 0.05x SW levels. As this is the least important of the A=120-140 element group, somewhat larger errors on the Sn abundance might be acceptable. RNAA measurements of Se and Te will be carried out in Phase B. Given the relatively short Phase B time scale measurement of I might not be possible, but we will explore I and Br analysis by measurement of neutron capture Xe and Kr respectively. Ba will be analyzed by ICPMS, and/or thermal ionization mass spectrometry in Phase B.
Objective 16: Literature data are available for 8 REE . Some samples analyzed by Takeuchi show light REE (La,Ce,Nd) concentrations around 0.03x SW values, but other samples with upper limits around 0.01x SW. In our analyses one Topsil sample had high La and Ce levels of about 0.3-0.4x SW. The other samples have upper limits of about 0.1x SW. In general our REE upper limits are about a factor of 10-50 higher than those of Takeuchi et al; the reasons for this are being investigated. If the INAA limits cannot be improved, we can use simple RNAA techniques for La, Ce, Tb, Yb, and Lu along with TIMS measurements of Nd and Sm to characterize the light REE.
Objective 13: The Pt-metal group of elements (Mo, Ru, Rh, Pd,
W, Re, Ir, Os, Pt, Au) could be more difficult as these elements
may tend to alloy with Si given the reducing conditions required
to produce Si metal, and exposure to at least some of these elements
occurs in the bulk Si reduction and crystal-producing processes.
Although Mo, W, and Au appear too high, Ir is quite low and the
Os upper limit is £5%. We can
afford to lose a few of these elements and still test for systematic
Pt-nugget fractionation in the solar nebula; in principle the
Ir abundance alone can accomplish this objective.
1.5 SOS. Epitaxial silicon on sapphire
(SOS), which is commercially available
for applications where radiation hardening is desirable or where
an insulator is desired for the structural backbone, was initially
considered. The intrinsic electrical properties of the Si in SOS
are nearly as good as FZ Si, but very little is known about individual
element impurities. At present SOS remains a possible back-up
material for Si wafers in the unlikely event that etching of Si
wafers to catch only the top 100 nm proves too difficult. Al is
an acceptable material for high flux reactor irradiation, and
the sapphire is not easily etched away. The Si can be easily stripped
from the sapphire substrate after irradiation, prior to gamma
counting.
2. Germanium. While we have baselined Si for collection
of solar wind, a small amount of Ge will be used for collection as well,
due to its advantages for analysis by SIMS.
However, testing the purity of Ge is much more difficult than for Si because the high
neutron capture cross sections of the Ge isotopes renders NAA useless.
2.1 General Characteristics. Hyper-pure zone-refined Ge is
produced up to 7 cm diameter for
nuclear detectors. This material is about as low as Si in electrical
impurities, with net impurity concentrations (the difference between
p-type and n-type carriers) of ~109 cm-3
available. Like Si, some data are available by techniques other
than NAA. The best crystals have 1013-1014
cm-3 each of O and Si if grown in a silica crucible,
and ~1014 cm-3 C if grown in a graphite
crucible (because of its viscosity and density, it is not possible
to produce Ge by the crucible-less FZ method on Earth). Of the
electrically active species, typically the most abundant impurities
are Al, P, B, and In, all generally below 1010 cm-3
(e.g., Haller, 1991). By comparison with Table M1, Ge is as good
as or better than Si in these elements, well below the solar wind
concentrations for these elements.
| Expected Solar Wind | |||||
| Element | |||||
| Mg | 3.1 ppba | 1. ppba | ---- | 1.0 ppba | 4000. ppba |
| Al | 1.5 | 0.4 | 1.2 | 0.3 | 320. |
| Si | 28. | 3. | 240 | 3. | 3800. |
| Ca | 0.2 | 0.03 | 0.3 | 0.05 | 220. |
| Sc | 0.2 | 0.07 | 5.6 | 0.11 | 0.13 |
| Ti | ---- | 0.3 | ---- | 0.5 | 9.1 |
| Cr | ---- | 0.3 | ---- | 0.5 | 50. |
| Mn | ---- | 0.4 | ---- | 0.6 | 36. |
| Fe | ---- | 1.7 | ---- | 2.6 | 3300. |
| Ni | ---- | ---- | ---- | ---- | 190 |
| Rb | ---- | ---- | ---- | ---- | 0.08 |
| Ba | ---- | ---- | ---- | ---- | 0.02 |
Results are given in Table M3. Doubly charged GeO and GeO2 did not seem to contribute any counts. Initially all of masses 24, 25, 26, 27, 28, 29, 30, 40, 44, 45, 48, 50, 52, 53, 55, and 56 were monitored, but after no unusual ratios turned up, only the major isotopes were monitored. Si was clearly measured in both samples. The mass 40 signal seemed to be Ca, as the 40/44 ratio was approximately correct for Ca. Likewise, the 25/24 and 26/24 ratios were approximately correct for Mg in the Tennelec sample. Signals at 27 and 45 were slightly above the dark current backgrounds, but it is less certain that these were actually Al and Sc.
From talking to the suppliers, it appears that most of the actual measurements except for Si are probably due to low levels of instrumental contamination.
This analysis, while rather cursory, shows that Ge purity is
clearly sufficient for Mg, Al, Si (1 sample < 1% of solar
wind), Ca, Cr, Mn, and Fe. By comparison with Table M3,
a SIMS analysis of Si had detection limits for ~50 ppba for
Ca and Ti due to interfering isobars
(Document J). The best
SIMS instruments have a factor of ~5 lower dark currents.
Even with the present instrument, other elements to be tested
in Ge could include F, S, Cl, Se, Br, Te, and I for negative
secondaries. For positive secondaries, Ni, Rb, and Ba will be tried.
3. Noble Metal Foils and Films. The highest purity metal
foil commercially available is 99.9999% (6-9s) pure gold foil.
This turns out to be not as pure as Si for most elements, but
it may have some advantages. For example, because gold has only
one isotope at relatively high mass, SIMS analyses will have almost
no interferences (see Document J).
Like Ge, gold is also not analyzable by NAA, so less information
is available on the impurities in gold. Fig. M3 plots the impurities
as assayed by the manufacturer (ESPI) ratioed to the expected
solar wind concentrations. Several elements are above the background.
Notable is Si, which will not be measurable in Si wafers. However,
Fig. M3 does not tell the whole story. SIMS analyses of foil samples
revealed that many of the impurities are concentrated near the
surfaces, a product of the rolling process. Therefore, it is important
to use a batch of foil coming off freshly electropolished rollers;
however, even this may not adequately remove particulate contamination.
Electron beam deposited Au on sputter-cleaned 6-9s Au foil could
be an adequate collector material for selected elements, such
as Si, light alkalis and Fe (which diffuse rapidly in Si), or
S (which has high surface concentrations on polished Si wafers).
The Au single crystals considered as backup material for the concentrator target
(section 4.1) are too small for the large areas needed for the
collector arrays. Epitaxial Au or Pt films might be ideal; however,
there are problems finding an acceptable substrate. Chang (IBM
research labs) has produced multilayer epitaxial films beginning
with Si crystals: Cu, then Pd, then Au or Pt. This is necessary
to have a suitable lattice spacing match for Au/Pt crystal growth.
However, the chemical complexity of the layers is a major disadvantage.
We have explored possible substrates which have a sufficiently
similar lattice spacing to grow Au/Pt crystals directly Only LiF
looks practical, but Li and F are both high priority elements,
ruling out LiF because of the cross- contamination risk.
Because at least one other material besides Si should be used
for general-purpose solar wind collection, an effort will be made
in Phase B to characterize both Ge and Au foils/films to see which
of these materials, if not both, should be used.
4. Concentrator Target Materials. As a primary requirement
the concentrator target must not have a native surface oxide layer,
and must have bulk oxygen concentrations lower than 1% of the
expected solar wind averaged over the top 100 nm. Additionally
it is desirable to have low concentrations of other light elements,
particularly N, C, and F. We are considering two materials: noble
metals and diamond, with diamond presently favored.
4.1 Single Crystal Noble Metals. Grain boundaries contain
the majority of all impurities in any polycrystalline material.
Single crystals therefore have significantly lower oxygen impurity
than foils, and also do not have the impurities (usually oxide
grains) associated with rolling foils. They still can have surface
impurities from the polishing process, though these are usually
less than from rolling. Single crystal metals are in a cost and
size range that make them suitable for the concentrator target
but not for bulk collectors. We have used SIMS to analyze gold
crystals in several different orientations and two different companies,
and a Pt crystal. All samples were from Monocrystals except for
one <100> Au crystal from ESPI; the Pt crystal had a <111>
orientation. The Monocrystal Au samples were first mechanically
polished and then electropolished (gold is so soft as to be difficult
to polish well mechanically). The Pt crystal was mechanically
polished. It had a much better looking surface, but turned out
to have contamination grains buried just below the surface. The
gold had some similar contamination, but not as many, and they
tended to be more on the surface. Our analyses focused on finding
the matrix purity and we were able to look between any
such contaminants. Hence we looked for the lowest elemental concentrations
within each SIMS profile.
TABLE M4 SINGLE CRYSTAL Au and Pt
Figure M3
Everything is an upper limit, in parts per million
atomic (ppma)
| Element | Sample | Solar Wind Conc. | |||
| ESPI Au | Mono Pt | ||||
| <111> | <100> | <100> | <111> | ||
| C | 0.69 | 0.34 | 34 | 0.54 | 250 |
| O | 0.48 | 0.12 | 1.8 | 0.003 | 580 |
| F | 0.02 | 0.01 | ---- | 0.19 | 0.021 |
| Al | ---- | 0.3 | ---- | ---- | 6.2 |
| Si | 0.042 | 0.42 | 0.63 | 0.42 | 73 |
| S | 0.068 | 0.068 | 0.102 | 0.25 | 25 |
| Cl | 0.26 | 2.3 | 0.2 | 4.1 | 0.13 |
The SIMS results are shown in Table M4 for O, C, F, and several other elements. Comparison is given with the solar wind, concentrated by a factor of 20x and averaged over the top 100 nm. It is clear that the oxygen background is below the desired 1% of the solar wind, and in some cases it is much lower. Carbon is also below this goal, but F will require further study. The results are upper limits because of instrumental background (see Document J).
Nitrogen in single crystal Au was also analyzed by static mass
spectrometry. The bulk sample had 0.63 ppma, just under the 1%
design goal for blanks.
4.2 Diamond is the only other known material with
essentially no native oxide layer and potentially low enough O
(and N) concentrations. The purity levels and diffusion
properties of natural diamonds have been studied for
some time because of their potential for revealing
information about the earth's mantle where they formed.
For example, the aggregation state of nitrogen in natural diamonds has
been used to study the thermal history of mantle diamonds. According
to IR analyses, nitrogen diffuses very slowly in single crystal
diamonds and requires high temperatures. For example, D was
estimated ~ 10-14 cm2/s at
1900oC (Chrenko et al., 1977; see also
Allen and Evans, 1981). Some other elements (e.g., helium, Wiens
et al. , 1994; lithium, Cytermann et al. , 1994)
have been demonstrated to have extremely low diffusivities in natural diamond.
CVD diamonds differ from natural diamonds in their formation
process and in the fact that they are polycrystalline. CVD
diamond producers have mentioned detection of a number of elements
as impurities, in contrast to the relatively high purities of inclusionless
type IIa natural diamonds. For species such as N and O, IR analyses can
yield relative abundances of particular molecular bonds, but may not give
quantitative results on the actual impurity concentration if some of the
impurity has a different bond structure or is trapped in inclusions.
This has motivated investigation of other methods for impurity analyses
(e.g., McNamara et al. , 1994).
| Isotope | Energy (keV) | Fluence (cm-2) |
| 1H | 11a | 2.0 x 1016 a |
| 13Cb | 72 | 1.2 x 1014 |
| 18O | 86 | 3.0 x 1014 |
| 15N | 79 | 4.0 x 1013 |
SIMS analyses were done using the Cameca IMS 1270 instrument at UCLA and an
IMS 4F at Charles Evans & Associates, both run in negative secondary ion mode.
In all cases, samples were kept under vacuum at least 12 hours prior to analysis.
For detection limit work, the primary Cs+ beam current was as high
as practical, ~100 nA; lower currents were used for diffusion experiments. A
normal incidence electron flood gun was used to help control charging except
during H analyses. The analytical area was 30 microns diameter. The C
matrix counts were monitored on a Faraday cup, with everything else measured on
an electron multiplier. Faraday-multiplier calibrations were performed within
a day of the analyses. Hydrogen and oxygen were typically analyzed at
low mass resolution (m/Dm ~ 500)
since there are no expected interferences.
Nitrogen was analyzed as the CN- molecule at mass 27. Mass 27 had
two peaks, one from 13C14N and one from
12C15N. Detection limit analyses were typically done
at low mass resolution, combining the contributions from both ions. However,
some samples, including an isotopically pure 12C diamond, were
analyzed at high mass resolution (m/Dm ~ 4,000).
Diffusion analyses for N
were done at high mass resolution as well, monitoring both the implanted 15N
and contaminant 14N.
4.2.2 Diamond SIMS Results: Impurities. Upon initial analysis using lower sputtering rates, the diamonds appeared to have consistently high concentrations of N and O, and relatively small but measurable amounts of F and Cl. However, these turned out to be instrumental artifacts. For most samples the counting rates for N and O were essentially constant, independent of the carbon matrix counting rates. Figure M4 illustrates this point by showing a sample that did have measurable N but no measurable O or F. The analysis started with a raster size of 100 microns and a field aperture of 30 microns. After conditions equilibrated, the raster was reduced to a spot, significantly increasing the matrix counts. The N counts increased along with the C, indicating that N was from the sample. The O and F counts did not increase, indicating that these were not associated with carbon from the matrix. The source of the background is discussed below. Because this instrumental background was constant, the best detection limits were obtained with the highest possible sputtering rate, with the primary beam striking completely within the field aperture, as in the right side of Figure M4. The background, and hence the detection limits, varied somewhat from sample to sample. What was initially thought to be Cl was actually C2B in at least some samples, confirmed by measurement of the correct proportions for the two isotopes of boron. In other samples, the mass 35 signal did not increase with the matrix, and was therefore all instrumental background.
The results for N, O, and F are shown in Table M6. Chlorine is not reported,
but following the above discussion, it should be significantly below 0.05 ppm,
measured at mass 35 in several samples. Note that only one sample ("G1")
had oxygen detected above the instrumental background. The lowest O limit
was 1.3 ppm in samples KMR1216 and "B12C". Nitrogen was
detected above background in KMR1216 and 1146, and in both of the ANL
samples. The lowest N limit was 0.12 ppm. The F measurements were verified by
a high mass resolution scan over mass 19, which confirmed the existence of a single
peak at the proper mass. However, like O and most N analyses, the fact that the F signal
did not rise with C when the primary beam was changed to spot mode indicates that
the F measured was instrumental contamination. The lowest F detection limit was
0.0025 ppm in both the "B Normal" and KMR 1216 samples.
TABLE M6 DIAMOND
Unless noted, all values are Upper Limits.
| O/C | O | F | N | S | Cl | |
| Sample | cps ratio | ppma (1) | ppma (2) | ppma (3) | ppma (4) | ppma (2) |
| B Normal | 1.07E-06 | 1.7 | 0.0025 | 0.12 | 0.012 | 0.062 |
| B 12C | 1.97E-06 | 1.3 | 0.0033 | 0.13 | 0.008 | 0.18 |
| B IF-1 | 1.2E-06 | 2.0 | 0.05 | 0.10 | ||
| GE 5 mm pol. | 1.2E-06 | 2.0 | 0.02 | 1.5* | ||
| GE 7 mm | 3.0E-07 | 0.5 | 0.03 | 0.6* | ||
| G1 | 8.10E-06 | 13 | 0.07 | 0.95 | 0.73 | 0.051 |
| KMR 1216 | 8.31E-07 | 1.3 | 0.008 | 25* | 0.016 | 0.048 |
| KMR 1251 | 2.31E-06 | 3.7 | 0.06 | 0.014 | 0.15 | |
| KMR 1146* | 9.78E-07 | 1.6 | 0.0025 | 20* | 0.016 | 0.1 |
| KMR 1175 | 1.4E-06 | 2.4 | 0.04 | 3.0* | ||
| KMR 1184 | 9.0E-07 | 1.5 | 0.36 | 21* | ||
| KMR 1192 | 9.0E-07 | 1.5 | 0.03 | 9.3* | ||
| KMR 1242 | 1.9E-06 | 3.3* | 0.04 | 36* | ||
| KMR 1267 | 1.5E-06 | 2.6 | 0.04 | 7.7* | ||
| Norton TF068 | 2.56E-06 | 4.1 | 0.062 | 0.48 | 0.041 | 0.12 |
| Norton TD 939 | 2.20E-06 | 3.6 | 0.057 | 0.33 | 0.029 | 0.12 |
| ANL 941012 | 1.5 | 0.07 | 7.5* | 0.01 | ||
| ANL 940928 | 2.5 | 2.5* | 125* | 0.08 | ||
| Solar wind, conc (5) | 170 | 0.006 | 22 | 7.4 ppma | .04 ppma | |
| O/C cps ratio from UCLA Cameca 1270 instrument. | ||||||
The source of instrumental background is most likely
steady state surface adsorption of volatile species on the analysis
spot during analysis. This is consistent with similar N and O
observations during gold analyses, in which an improvement in
the vacuum pressure over more than an order of magnitude improved
the detection limit by approximately the same factor. The reason
for background--and therefore detection limit--variations between
different diamond samples is not completely understood, though
it might be explained by the smoothness of the surface and the
exact conditions such as temperature and pressure within the instrument
at the time of analysis. The rate of adsorption of a gas on the
surface is independent of the rate at which the sample is sputtered,
but dependent on the partial pressure of the gas species involved.
Experiments to heat the sample during analysis are currently
planned, as this should lower the fraction of gas molecules sticking
to the surface.
One can calculate an upper limit to the amount of signal attributable to surface adsorption from the gas phase. A pressure of 5 x 10-10 Torr is equivalent to 2.0 x 1011 molecules/cm2/s incident on the surface. For a 30 m field aperture, the flux is ~1.4 x 106 molecules/s. Assuming a sputter yield of Y = 3 C/Cs+, a 100 nA primary beam would give a ratio of impurity molecule/C of 7.4 x 10-7, or 0.74 ppm. This is an upper limit because it would require all adsorbed molecules to stick until bombarded by a Cs+ ion, and assumes all of the gas in the chamber is the impurity being measured. Rough surfaces would result in greater surface area, and higher adsorption. Molecular oxygen (O2) or nitrogen (N2) would give a factor of 2 higher upper limit because there are two atoms per molecule. Qualitatively this result is in the same range as the instrumental backgrounds observed for the diamonds. Similar unpublished measurements on single crystal gold, which should have a sputter yield approximately a factor of five higher, have an ultimate detection limit a factor of ten lower than the best diamonds.
Constant gas-phase adsorption would appear to be a good explanation for the background, provided that the sample area struck by the primary ions is always larger than the field aperture, so that the measurement always covers the same area. If the spot mode causes the primary beam to strike an area smaller than the field aperture, the effective measurement area would be reduced, and the adsorbed gas contribution should be reduced along with it. Typical primary ion beam diameters are 10 microns FWHM, smaller than the 30 micron field aperture. However, it is conceivable that in spot mode, the beam is intense enough that the fringes extend to the edge of the field aperture, so that the effective area, in terms of sputtering adsorbed species, is not reduced significantly.
4.2.3 Diamond SIMS Results: Diffusion. Implant profiles for N, O, and H in the unheated and heated pieces of TD939 are compared in Figs. M5, 6, and 7. The shoulders near the surface are predominantly due to the Au conductive coat. Concentrations are ratioed to C, which is low in the coat relative to the diamond matrix, while N and O are higher in the Au than the diamond. In Fig. M5 the geometric means of two to three profiles are plotted for each temperature. Reproducibility is discussed below. For N and O, the backgrounds were subtracted from the 15N and 18O profiles using the 14N and 16O profiles. This subtraction did not eliminate the near-surface shoulders completely because the signal was dropping so rapidly in this region that small differences in the analysis times of the individual isotopes became significant. The rising portion of the main peak matches the TRIM (IBM Theoretical Ranges of Ions in Matter) simulation well, while all of the distributions have longer tails than predicted by TRIM, due to channeling within individual crystals.
The important point to note is that the heated and
unheated profiles are identical within the limits of expectation
with a slightly rough surface. Diffusion would cause an increase
in the dispersion around the mean, given by


Diffusion: Solar Wind Applications. For the purpose of solar wind collection, it is important to know whether the elements of interest (N, O, Ne, Li, etc.) diffuse in CVD diamond at temperatures up to 200oC. Since we determined only upper limits on diffusivity at 400oC and 850oC, it is not possible to estimate D(200o) from an Arrhenius plot. Instead, a most conservative approach would be to say that an upper limit is given by the upper limits determined at 400 and 850oC. This is ~5 x 10-18 cm2/s. Over an exposure period of approximately two years, this would lead to a characteristic diffusion length of sqrt(4Dt) = 23 nm. This is smaller than the concentrator target's 100 nm depth for the implantation peak, but it is possible that the atoms will only need to diffuse to a grain boundary before they can escape.
More realistically, Chrenko et al. estimated D ~ 10-14
cm2/s for N in diamond at 1900oC. Using this value
and our upper limit at 850oC, one can extrapolate a diffusivity
upper limit of 2 x 10-27 cm2/s, which translates to less
than a fraction of an Angstrom in two years. One can also use estimates of the
activation energy for nitrogen in diamond, based on the changes of IR spectra
as a function of heating. One is from Chrenko et al., who estimates
the activation energy to be 60 kcal/mol. Using this value, and his diffusivity
estimate of 10-14 cm2/s at 1900oC, one
gets D ~ 6 x 10-36 cm2/s at 200o, meaning
that atoms are firmly held in place. It is thus expected that the actual
D values for N, O in diamond are many orders of magnitude
lower than we could measure.
4.2.4 Diamond SIMS Study Conclusions. The oxygen and nitrogen
upper limits were in at least several cases below 1% of the expected
concentrated solar wind values, meeting our purity goals. In addition,
F concentrations are below that expected for the concentrated solar
wind. Though not shown here, S concentrations were also below 1%
of the expected solar wind, which would be applicable if CVD diamond
is also used as a collector for unconcentrated solar wind.
Diffusion studies indicate that solar wind-implanted N and O will be
retentively held at temperatures of up to 200oC for the
duration of the mission, though longer duration studies are presently underway to
confirm this.
A final result of our study is that for diamond there is no detectable
radiation damage from the fluence levels expected for the solar wind.
This study substituted H for He, so the conclusions should be tested
again, but from studies of similar He fluences and energies in
metals, no damage is expected.
4.3 Comparisons between noble metals and CVD diamond.
There are a number of differences between diamond and noble metal foils besides
those mentioned above. Obviously solar wind carbon cannot be measured in a
diamond matrix. This means that either diamond must be used in tandem with
another material for the concentrator target, or solar wind carbon must be
analyzable without concentration. Secondly, the chemistry during sample
extraction differs between the two matrices. Solar wind oxygen extracted
from diamond would come out predominantly as CO, greatly simplifying the
procedure for GSMS of O as CO molecules (see
Appendix J). On the other
hand, GSMS of O as O2 may be simpler by extraction from a noble metal
matrix. A disadvantage of diamond is that it is not a good electrical conductor.
A diamond target would need to be very thin in order to avoid charging. Further
tests will need to be done in this regard.
An important difference is that the ions are implanted quite differently in the
two matrices due to the large difference in atomic number between C and
noble metals. Actual ranges and straggles (standard deviations) for
two charge states are compared in Table M8.
Implantation in noble metal gives a relatively broad shallow peak. Approximately
20% of the ions are backscattered out of the target. This fraction is slightly dependent
on atomic mass, with TRIM calculations showing approximately 5 permil/amu
fractionation for oxygen of the same charge state and normal incidence.
More calculations to cover the range of angles and charge states need to be done to
determine the overall mass fractionation. By comparison, implantation in diamond
gives a deeper peak (Fig. M5), which makes solar wind easier to separate from surface
contamination and has negligible mass fractionation.
|
|
Both diamond and noble metals are matrices characterized by very low diffusion of trace elements, as was shown above for diamond.
The overall differences between diamond and noble metals are summarized in Table M9. Our present plan is to use diamond for the concentrator target. However, we have to deal with the potential charging problems. At present Au is a back-up material.
| Table M9 Concentrator Target Materials Characteristics Summary | ||||
| O Purity | ||||
| N Purity | ||||
| C Analysis | ||||
| O Analysis by GSMS | ||||
| Surface Cleanliness | ||||
| Low Diffusion | ||||
| Electrically Conductive | ||||
| Implant Depth and Straggle | ||||
| Mass Fractionation by Backscattering | ||||
5. Materials for Noble Gas Collection. Metal foils are
preferred for noble gases because of their history dating back
to the Apollo solar wind foils experiment, along with the fact
that noble gas backgrounds are typically very low in most materials.
For example, the Xe blank in an off-the-grocery-shelf Reynolds
Wrap foil is 0.0018 parts per trillion atomic, or 3.9 x
10-4 times the 2-year solar wind fluence averaged over
the top 100 nm. The lighter noble gas blanks are even better relative
to the solar wind. It turns out that the Bern foils used for the
Apollo solar wind experiment have nearly the same blanks as Reynolds
Wrap except for Ne, where the Bern foils are a factor of five
better.
5.1 Solar wind.
Noble gas mass spectrometry has traditionally been a bulk analysis
technique. However, even with these low blank concentrations,
consuming the whole foil results in blanks that are up to a few
percent of the bulk solar wind fluence. Sampling noble gases from
individual types of solar wind, such as coronal mass ejections
(CMEs), is a high science priority. The CME fluence could be as
low as 10% of the total solar wind fluence, in which case, a blank
from the whole foil would be too high. Because of this, we are
planning to use laser extraction to remove only the near-surface
layer rather than melting the whole foil. This may be most easily
accomplished if the noble gases are implanted into a thin metal
layer on a refractory substrate. The thin layer would be volatilized
by a pulsed laser, leaving the substrate untouched. There are
two such materials we are currently investigating: silicon on
sapphire (SOS) and aluminum on sapphire (AOS). The SOS (mentioned
in 1.5 above) is made from ultra-high purity starting materials.
AOS has been used for low-blank Kr work for a number of years
(N. Thonnard, personal communication). Samples of both materials
are at C. Hohenberg's lab awaiting analysis using the laser extraction
system. Aluminum is preferred due to its heritage and because
Si surfaces has been reported to adsorb and hold atmospheric Xe
very tightly (e.g., Garrison et al., 1988).
5.2 Energetic Particles.
Efforts are underway to collect high energy solar particles (SEP) for separate
analysis. The existence of a SEP noble gas component for Ne, Kr, and Xe with
a composition distinct from solar wind has been postulated for the last fifteen
years, though it has never been confirmed by direct analysis in space. We have recently
added this to our list of objectives (Table 1-2
in proposal). It may be possible to separate
SEP noble gases by stepped heating, as has been done for lunar grains.
However, an unambiguous way to measure SEP would be to collect it separately
in a multilayer target. Preliminary plans are for a three-layer target consisting of a
0.2 micron Si film deposited on a 1.0 micron Au foil, physically supported by a high
transparency (>90%) mesh. The bottom layer would be a ~4 micron Au foil to capture
ions in the > 100 keV/amu range (Table M10). To separate solar wind (< 10 keV/amu)
from the intermediate (10-100 keV/amu) range, the Si thin film is removed from the 1
micron foil by an acid etch.
| Table M10. Implantation ranges of noble gases in Au foil | ||
|---|---|---|
| E (keV/amu) |
Ne Range (microns) |
Xe Range (microns) |
| 10 | 0.11±0.09 | 0.12±0.06 |
| 100 | 0.83±0.29 | 1.15±0.30 |
| 1000 | 3.88±0.41 | 5.26±0.49 |
Karen McNamara Rutledge
In order to meet the requirements for this mission, ultra-high purity
materials are required. One of the objectives of this mission is to determine
the isotopic composition of oxygen in the solar wind. A large
area (40 cm2)
ultra high purity, carbon-13 enriched diamond sample is required to achieve
the necessary sensitivity for this measurement. A number of facts, including
data on natural diamonds, as well as man-made synthetic materials, lead
us to believe such a material can be produced.
Natural diamonds can vary considerably in impurity concentration, yet it
is anticipated that type IIa (highest quality) natural diamonds contain very
little oxygen. The variations in impurity content in diamond may be, in part,
due to variations in the growth environment within the Earth's mantle
where diamond formation takes place.1.
Unfortunately, our knowledge
of this growth environment is primarily limited to what we can determine from
after the fact analysis. Typically, the most abundant impurity in high quality
natural diamond is nitrogen, in concentrations as high as 0.3 atomic %, while
other impurities are found at concentrations orders of magnitude lower. One of
the most extensive impurity studies in natural diamond was carried out by
Sellschop et al. using neutron activation analysis.2,3
These studies included the
first measurements of the oxygen contents in natural diamonds which ranged
from 11 to 1700 ppm, with most high quality diamonds containing 30-40 ppm of
oxygen.2 Since this study included over 1500 natural stones, it provides one of
the most extensive data bases on oxygen contents in diamond that is currently
available.
At the time of their study, Sellschop et al. did not have the capability of exploring
the distribution of oxygen in samples with low oxygen content. For diamonds
with high oxygen contents, in the range of hundreds of ppm, it could be shown
that much of this oxygen was associated with metallic
inclusions.4 In type IIa
samples, which contain few inclusions, however, oxygen contents of 30-40 ppm
were observed in good agreement with the 35 ppm required for surface coverage
of diamond lattice. It is likely that this surface oxygen is a result of the cleaning
procedure which included a hot acid treatment and an
organic wash. This treatment has since been shown to terminate the exposed
diamond surface with oxygenated groups.5,6
In addition molecular orbital
calculations predict prohibitively large energies for substitutional oxygen in
diamond, and no evidence of the predicted spectral features associated with such
defects has been observed experimentally7.
These results support the unlikelihood
that a significant amount of oxygen is actually incorporated into the bulk of
natural diamond, as would be expected based on the lattice parameter as well.
High-Pressure High-Temperature Diamonds
HPHT synthetic diamonds were first produced in the early 1950's and still
represent a viable commercial industry today.1
The process for production of
these small (typically 1-2 mm diameter) crystals is one which mimics the high-
pressures and high-temperatures present within the Earth during natural diamond
formation. However, a transition metal catalyst is added to the system to allow
synthesis at economical conditions. These transition metals represent the major
impurity in synthetic HPHT diamonds. Although the nitrogen content in HPHT
diamonds is carefully controlled, the oxygen content is generally not monitored.
However, as a result of the reducing graphitic environment of the diamond
formation, little oxygen is actually incorporated into the diamond phase. Like the
results for natural diamond, most of the oxygen which is incorporated has been
associated with the metallic impurities. In the formation of large gem-quality
stones, the oxygen is essentially eliminated by a metallic species which acts as a
getter during crystal formation. Thus, synthetic diamonds with oxygen contents
below detectable levels (ppb) have been made by the HPHT
process.8
Chemical Vapor Deposited Diamonds
Although both natural and HPHT synthetic diamond can possibly be obtained
with the desired oxygen purity (<~ 1 ppm), the costs of obtaining a sufficient
amount of these materials is prohibitively high. In addition, natural diamond
with the appropriate carbon-13 concentration cannot be obtained. Chemical vapor
deposition is an attractive technique for economically producing large area
enriched diamond (i.e. 40 cm2).
In addition, previous results have shown that
high quality type IIa diamond can be produced by various CVD techniques. This
material exhibits the properties of type IIa natural diamond, such as high thermal
conductivity and optical transparency, however, the level of oxygen in these
materials has not been extensively explored. In fact, many CVD processes use
oxygen as
an additive to enhance the growth rate of CVD diamond.
CVD processes which use oxygen or compounds containing oxygen in the feed
gas typically have a gas-phase composition: 1-2 % oxygen; 3-5 % carbon, and 93-
96 % hydrogen. In cases where 2.0% 02
was intentionally added to the diamond
growth environment, combustion analysis demonstrated an oxygen content of 0.1
% in the product diamond film. This demonstrates that while oxygen can be
incorporated into these polycrystalline films, it is incorporated at a significantly
lower rate than carbon species. In addition, further examination of these samples
using X-ray photoelectron spectroscopy (XPS) has demonstrated that a substantial
amount of this oxygen can be associated with the diamond
surface.9 Again, this
may be a result of the cleaning procedure (similar to those above) used to prepare
the samples for analysis. In our growth system, oxygen will not be added to the
gas-phase, eliminating this source of contamination, and alternative cleaning
procedures will be followed.
Although many CVD diamond growth processes do not have oxygen intentionally
added to the gas-phase, many of the systems used for diamond growth, such as the
early hot-filament reactors, are not UHV rated and possess substantial air leaks.
For example, a hot-filament sample, produced with nominally no oxygen in the
gas phase, contained 100 ppm of oxygen by combustion analysis. However, the
leak rate on the system was found to be 0.1 torr/min, providing more than
sufficient oxygen to account for that observed in the sample. This example, serves
to demonstrate the importance of ultra-high vacuum equipment for the deposition
of extremely high purity diamond.
Another potential problem for both the hot-filament and dc-arcjet deposition of
CVD diamond is the incorporation of metallic impurities. Studies of both natural
and HPHT diamonds have shown that oxygen is likely to be associated with such
inclusions.2-8 Microwave
plasma diamond deposition can provide the advantage
of both UHV environment and very low metallic impurity incorporation, and
thus will be used in this work.
Since the level of purity demanded here is higher than most previous applications,
extra measures must be taken to limit oxygen contamination. First, most diamond
CVD systems are vacuum limited by at least one 0-ring seal (this includes
commercially available microwave systems 10),
which much be eliminated to
achieve leak rates below about 10 Torr. This has been achieved by the author in a
system similar to the one proposed here. Once
contamination from the atmosphere is eliminated, contamination from the gas
supply and equipment must be considered. Oxygen contamination in the reactants
can be minimized with the installation of a getter in the feed line to the reactor.
Oxygen contamination from the vessel itself may be minimized through the use of
bakeable components and a thorough bake-out procedure. Finally, if these
procedures are insufficient to reduce the oxygen levels below 5 ppm, an oxygen
scavenging species can be added to the gas phase to reduce the free oxygen
available to react with the growing diamond.
References
WPI, 1997
Natural Diamonds
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